Nanofabrication at the Center for Nanoscale Materials
November 27,2007
11.00am to 12.00pm, Engr. III Room 101.
Dr. Leonidas Ocola
Nanofabrication theme co-leader at the Argonne National Laboratory Center for Nanoscale Materials (CNM)
Abstract
Electron beam lithography has represented the most effective way to pattern materials at the nanoscale for almost four decades. The success of e-beam lithography depends on multiple factors such as electron optics, the interaction between the beam of electrons and the pattern material (resist), and the interaction between the developer and the exposed resist. At the Center for Nanoscale Materials at Argonne we use a Raith 150 ebeam tool that operates at 30 KV and a JEOL 9300 ebeam tool that operates at 100KV. We will discuss the spatial resolution achievable with electron beam lithography by cold [1] and hot development [2, 3]. Our results show improved resolution and contrast for resists that are exposed by polymer chain scission. Others results [2, 3] show that similar effect happens with crosslinked resist in opposite manner. Both share the common dissolution mechanism of molecular weight based dissolution.
In addition to electron beam lithography, the Center for Nanoscale Materials counts with other lithographic tools, such as, a dual beam FIB, configured for lithography, a step and repeat nanoimprint tool, reactive ion etch tools and very soon a laser writer for direct write optical lithography. Furthermore what makes our center unique is an x-ray beamline designed to focus hard x-rays (> 10KeV) below 30 nm. This talk will describe about the capabilities of our facility and other research projects underway in nanofluidics, and nanophotonics.
Bio
Dr. Leonidas Ocola (Ph.D. University of Wisconsin-Madison, 1996; postdoc: University of Wisconsin-Madison) is an internationally recognized expert in electron beam lithography. Dr. Ocola is from Peru where he did his undergraduate study in Physics. He received his B.Sc. from the Universidad Nacional de Ingenieria (Lima, Peru) in 1988. He has held industry positions at Bell Laboratories, first with Lucent Technologies and then with Agere Systems, a later spin-off, working in the areas of projection electron beam lithography and then in high resolution electron beam nanolithography. His research interests include electron beam lithography and simulating high-energy electron beam interactions with polymer materials, scanning probe characterization techniques, FTIR micro-spectrosc opy, single molecule spectroscopy, nanofluidic devices and nano-photonics. Dr Ocola has been involved with several conference program committees on nanofabrication and nanotechnology for many years and recently served on NSF a panel on nanotechnology. He is currently co-chair of the NanoFabrica ion Symposium held at the Nano Science and Tehcnology Institute (NSTI) NanoTech conference since 2006, which has more than 3000 attendees. Dr. Ocola joined Argonne National Laboratory in 2002. He is currently the Nanofabrication theme co-leader at the Argonne National Laboratory Center for Nanoscale Materials (CNM) and has successfully managed $9M in instrumentation procurements for the nanofabrication facility at the CNM. He has co-authored over 50 papers, 1book, and 1 patent.
