Announcing the Final Examination of Mr. Jose A. Cunado for the degree of Master of Science

Control and Stabilization of Laser Plasma Sources for EUV Lithography

Mr. Jose A. Cunado
Wednesday, June 20, 2007
11:00AM - CREOL A214

Abstract


This study investigates Extreme Ultraviolet (EUV) sources which rely on droplet laser plasmas for EUV generation. These sources consist of a small (30 µm diameter) droplet which is excited into plasma emitting EUV around 13.5 nm, the industry's chosen wavelength for EUV lithography (EUVL). These sources are the best candidates for the commercialization of EUVL allowing mass production of computer chips with 32 nm or even smaller feature size. However, the biggest challenges which EUV source developers encounter today are the issues of conversion efficiency (CE) and debris. In order to satisfy the technology requirements, the source will need to meet high levels of stability, performance, and lifetime. Our tin-doped droplet plasma has demonstrated high CE and low debris resulting in long lifetime. Long term stability is obtained through the use of novel tracking techniques and active feedback.

The laser plasma targeting system combines optical illumination and imaging, innovative droplet technology, advanced electronics, and custom software which act in harmony to provide complete stabilization of the droplets. Thus, a stable, debris-free light source combined with suitable collection optics can provide useful EUV radiation power. Detailed description of the targeting system and the evaluation of the system with CE and debris measurements will be presented.

Outline of Studies

  • Major: Electrical Engineering
  • Educational Career:
    • B.S., University of Central Florida, 2005
  • Committee in Charge:
    • Dr. Martin C. Richardson
    • Dr. Kalpathy Sundaram
    • Dr. Michael G. Haralambous