 . Announcing the Final Examination of Ms. Shailini Dhru for the degree of Master's of Electrical Engineering
Date: July 19, 2007
Time: 03:00 p.m. Room: HEC 356 Dissertation title: Process development for the fabrication of mesoscale electrostatic valve assembly This study focuses on two of the main processes involved in the fabrication of an electrostatic valve assembly.
Thick resist photolithography and Wet chemical etching of Kapton polyamide film Through holes were to be etched in a 350 µm Silicon wafer using deep reactive ion etching technique. A thick positive resist AZ PR4620 was used to develop the valve pattern on the wafer. Spin speed, exposure time and hard bake time were varied to achieve the strait walled profile.
Kapton polyamide film was used as a stand off between the two electrodes of the valve structure. Different etching solution concentrations were used. Post etch surface roughness and thickness uniformity of the kapton film were measured. Recommendations were made for modification and future applications of the processes used in the study and for continued research in the various stages of the student-to-teacher educational process.Major: Microelectronics Fabrication
Committee in Charge:
Dr. Kalapathy B. Sundaram Dr. Parveen Wahid Dr. Xun Gong Approved for distribution by Dr K.B.Sundaram, Committee Chair, on July 18, 2007.
The public is welcome to attend.
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